Webb10 apr. 2024 · Although the current reports on helium ion implantation in silicon, it is mainly used for proximity gettering of transition metal impurities [ 16 ], reduction of dislocation density [ 17 ], etc., we think it is a potential method in the preparation of porous silicon. Helium ion implantation in silicon can produce a nanocavity structure. WebbProximity gettering of silicon wafers using CH 3 O multielement molecular ion implantation technique; An Electronics Division Retrospective (1952-2002) and Future Opportunities in …
Proximity gettering technology for advanced CMOS image sensors …
WebbIn this paper, we test proximity gettering layers obtained by carbon or silicon implantation for their efficiency in molybdenum and tungsten gettering. DLTS was used to measure … Webb1 jan. 2014 · Proximity gettering methods by C and Si implantation were tested for their ability to capture slow diffusers such as Mo and W, two metallic elements extremely … spg royalties inc
Proximity gettering of slow diffuser contaminants in CMOS
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